Modification of Pigments Utilizing ALD (Atomic Layer Deposition) in Varying Electrical Resistivity
materials and coatings
Modification of Pigments Utilizing ALD (Atomic Layer Deposition) in Varying Electrical Resistivity (GSC-TOPS-203)
Provides tailorable resistivity to meet varying programmatic requirements.
Overview
Stable white thermal control coatings are commonly used on radiators for a variety of missions. In orbital environments where surface charging occurs, these coatings must adequately dissipate charge buildup. To dissipate this charge buildup one must encapsulate the coating pigment with conductive and stable components, which often suffers from undesirable solar absorptance and less stability.
The Technology
NASA Goddard Space Flight Center has developed an application for atomic layer deposition (ALD) for coating pigments to prevent charge buildup. Through introducing paired precursor gases, these coatings can be deposited on a myriad of substrates, including glass, polymers, metals, aerogels, and high aspect ratio geometries and powders.
Benefits
- Better thickness control of deposited coatings
- High resistivity control through coating thickness selectivity
Applications
- Thermal control
- Space weather
