Automated transfer of large-area defect-free graphene using a fluid transfer system

The innovation is a series of inter-connected fluid reservoirs. The first reservoir comprises an etching agent that dissolves the growth substrate of a graphene sample. Subsequent reservoirs contain deionized water designed to wash off the etching agent. A graphene sample comprising a polymeric top coat, graphene layer, and growth substrate is floated in the first etchant reservoir. When the growth substrate has dissolved in the etchant fluid, the level of that reservoir is raised with additional etchant fluid. The rising etchant fluid level causes the etchant to flow into the next reservoir, creating a gentle current. The graphene sample floats along the current and is subsequently transferred into the next deionized water reservoir. The etchant is washed off in the deionized water. Once all the etchant is washed off, an application substrate is placed at the bottom of the deionized water reservoir. When the deionized water is drained, the graphene sample is mated with the application substrate via Van Der Waals forces. This innovation democratizes the the production of graphene, allowing it to be processed reliably and easily in house. This system can be utilized as a post-processing system for graphene production providing graphene substrates while keeping sensitive research and development safely in-house.