Packaging for SiC Sensors and Electronics

NASA Glenn's durable, extreme-temperature, integrated circuit chips begin with the replacement of conventional silicon IC transistors with n-channel SiC junction field effect transistors (JFET) and resistors that can reliably function above 500°C. JFETs with the necessary high-temperature stability and electrical gain are fabricated from commercial 4H-SiC wafers with epilayers using dry etching and a self-aligned n-type ion implantation. An innovative circuit approach creates digital logic gates from these normally-on n-channel JFETs and resistors. Using two levels of 500°C durable metal to interconnect numerous SiC gates, complex circuits enabling a variety of control, operation and sensing functions for intelligent systems in harsh environments can be implemented in physically small chips. The challenge of getting electrical signals to and from the chip in a harsh environment is overcome by the use of the iridium interfacial stack (IrIS) that acts simultaneously as a bond metal and diffusion barrier, and can be used on an ohmic contact to the SiC. Combined with Glenn-developed high-temperature durable ceramic chip packaging and harsh environment sensor technology, this revolutionary durable integrated circuit technology is game changing for harsh-environment applications of all types.

To avoid catastrophic failure, traditional electrical ohmic contacts must be placed at some distance from the optimal position (especially for sensors) in high-temperature environments. In addition, conventional metallization techniques incur significant production costs because they require multiple process steps of successive depositions, photolithography, and etchings to deposit the desired ohmic contact material. Glenn's novel production method both produces ohmic contacts that can withstand higher temperatures than ever before (up to 600°C), and permits universal and simultaneous ohmic contacts on n- and p-type surfaces. This makes fabrication much less time-consuming and expensive while also increasing yield. This innovative approach uses a single alloy conductor to form simultaneous ohmic contacts to n- and p-type 4H-SiC semiconductor. The single alloy conductor also forms an effective diffusion barrier against gold and oxygen at temperatures as high as 800°C. Glenn's extraordinary method enables a faster and less costly means of producing SiC-based sensors and other devices that provide quicker response times and more accurate readings for numerous applications, from jet engines to down-hole drilling, and from automotive engines to space exploration.

In conjunction with academia and industry, NASA's Glenn Research Center has developed a range of microelectromechanical systems (MEMS)-based and Silicon Carbide (SiC)-based microsensor technologies that are well-suited for many applications. The suite of technologies includes hydrogen and hydrocarbon leak detection sensors; emissions sensor arrays; and high-temperature contact pads for wire bond connections. Currently used to protect astronauts on the International Space Station, the hydrogen and leak detection sensors have many Earth-based applications as well. They can function as a single-sensor unit or as part of a complete smart sensor system that includes multiple sensors, signal conditioning, power, and telemetry. The system can comprise sensors for hydrogen, hydrocarbons, oxygen, temperature, and pressure. The emissions sensor array features a gas-sensing structure that detects various combustion emission species (carbon monoxide, carbon dioxide, oxygen, hydrocarbons, and nitrogen oxides) over a wide range of concentrations. In addition, the emissions sensor array remains highly sensitive and stable while providing gas detection at temperatures ranging from 450 to 600°C. These new sensors provide a combination of responsiveness and durability that offers great value for a wide range of applications and industries.

Glenn's invention is game-changing in its ability to produce ultra-thin SiC-based microstructures and diaphragms that are essential for high-sensitivity pressure sensors that not only monitor engines but can also act as biosensors (monitoring bone density or brain pressure). DSRIE offers selective etching that reliably isolates conductive microstructures from the bulk material and has precision-etch control that minimizes yield loss due to manufacturing defects. Therefore, the thickness of structures, such as diaphragms, can be ultra-thin and selectively realized during dopant reactive ion etching. The ultra-thin diaphragm is a key enabler for Glenn's novel pressure sensor that can measure at low pressures in the sub-psi range. Until now, batch fabrication of SiC sensors has been hindered by the fact that only one type of sensor per wafer could be produced at a time. Given the expense of fabrication, this limitation has greatly reduced the commercial viability of SiC sensors and electronics. Glenn's batch fabrication offers manufacturers the opportunity to simultaneously produce multiple multifunctional MEMS/NEMS products on a single SiC wafer. Such products include flow sensors, pressure sensors, biosensors, accelerometers, inertial sensors, angular rate sensors, and yaw rate sensors. By simplifying production, reducing capital equipment, and lowering production costs, Glenn's novel process makes the use of SiC-based MEMS/NEMS in sensors and electronics much more practical and attainable for countless industries.

Aimed at structural applications up to 2700°F, NASA's patented technologies start with two types of high-strength SiC fibers that significantly enhance the thermo-structural performance of the commercially available boron-doped and sintered small-diameter “Sylramic” SiC fiber. These enhancement processes can be done on single fibers, multi-fiber tows, or component-shaped architectural preforms without any loss in fiber strength. The processes not only enhance every fiber in the preforms and relieve their weaving stresses, but also allow the preforms to be made into more shapes. Environmental resistance is also enhanced during processing by the production of a protective in-situ grown boron-nitride (iBN) coating on the fibers. Thus the two types of converted fibers are called “Sylramic-iBN” and “Super Sylramic-iBN”. For high CMC toughness, two separate chemical vapor infiltration (CVI) steps are used, one to apply a boron nitride coating on the fibers of the preform and the other to form the SiC-based matrix. The preforms are then heat treated not only to densify and shrink the CVI BN coating away from the SiC matrix (outside debonding), but also to increase its creep resistance, temperature capability, and thermal conductivity. One crucial advantage in this suite of technologies lies in its unprecedented customizability. The SiC/SiC CMC can be tailored to specific conditions by down-selecting the optimum fiber, fiber coating, fiber architecture, and matrix materials and processes. In any formulation, though, the NASA-processed SiC fibers display high tensile strength and the best creep-rupture resistance of any commercial SiC fiber, with strength retention to over 2700°F.